| 发明名称 |
PLASMA PROCESSOR |
| 摘要 |
A plasma processor comprises a first filter (27) which is connected between a susceptor (21) and a ground and has a variable impedance, a sensor (28) which senses an electric signal based on the condition of a plasma (P) generated in a processing chamber (11), and a control means (36) which controls the impedance of the first filter (27) from the result of sensing outputted from this sensor (28). This constitution realizes a preferable plasma distribution matching with the purpose of plasma processing.
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| 申请公布号 |
WO02093631(A1) |
申请公布日期 |
2002.11.21 |
| 申请号 |
WO2002JP04691 |
申请日期 |
2002.05.15 |
| 申请人 |
TOKYO ELECTRON LIMITED;KOSHIMIZU, CHISHIO;YAMAZAWA, YOHEI |
发明人 |
KOSHIMIZU, CHISHIO;YAMAZAWA, YOHEI |
| 分类号 |
H05H1/00;B01J19/08;C23C16/509;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;H01L21/31;H05H1/46;(IPC1-7):H01L21/306 |
主分类号 |
H05H1/00 |
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