发明名称 |
HOLLOW ANODE PLASMA REACTOR AND METHOD |
摘要 |
The plasma processing apparatus includes a plasma chamber, a first electrode, a second electrode, and a plasma containment device. The plasma containment device has a plurality of slots and is electrically coupled to the first electrode. The containment device is configured to confine plasma within an inter-electrode volume while facilitating maximum process gas flow. When plasma is generated by applying electric fields to process gas within the inter-electrode volume, the containment device electrically confines the plasma to the inter-electrode volume without significantly restricting the flow of gas from the inter-electrode volume.
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申请公布号 |
WO02093616(A1) |
申请公布日期 |
2002.11.21 |
申请号 |
WO2002US15427 |
申请日期 |
2002.05.14 |
申请人 |
LAM RESEARCH CORPORATION;BENZING, DAVID, W.;KADKHODAYAN, BABAK |
发明人 |
BENZING, DAVID, W.;KADKHODAYAN, BABAK |
分类号 |
H01J37/32;(IPC1-7):H01J37/32 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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