发明名称 Gas treatment device and system, and method for making the same
摘要 One embodiment of a gas treatment device comprises: a substrate; a housing disposed concentrically about the substrate, the housing comprising a first portion having a decreasing internal diameter from a first end to a main body portion, the main body portion extending from the first portion; and a mat support material disposed concentrically about the substrate to form a subassembly, wherein the subassembly is at least partially disposed in the main body portion. One embodiment of a method for producing the gas treatment device comprises: disposing a mat support material about a substrate to form a subassembly; passing at least a portion of the subassembly into a main body portion of a housing comprising a first portion having a decreasing internal diameter from a first end to the main body portion, the main body portion extending from the first portion.
申请公布号 US2002172626(A1) 申请公布日期 2002.11.21
申请号 US20010862176 申请日期 2001.05.21
申请人 LESHER ERIC J.;MYERS STEPHEN J.;FOSTER MICHAEL R.;BOEHNKE JOHN 发明人 LESHER ERIC J.;MYERS STEPHEN J.;FOSTER MICHAEL R.;BOEHNKE JOHN
分类号 B01D53/88;F01N3/28;(IPC1-7):B01D53/34 主分类号 B01D53/88
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