发明名称 |
Two-step flourinated-borophosophosilicate glass deposition process |
摘要 |
A method for depositing a layer over a substrate includes depositing a first halogen-doped borophosphosilicate glass (BPSG) layer over said substrate at a first pressure level. A second halogen-doped BPSG layer is deposited over said first layer at a second pressure level, wherein said first pressure level is higher than said second pressure level.
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申请公布号 |
US2002173169(A1) |
申请公布日期 |
2002.11.21 |
申请号 |
US20010832756 |
申请日期 |
2001.04.10 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
CAMPANA FRANCIMAR;XIA LI-QUN;YIEH ELLIE |
分类号 |
C23C16/40;H01L21/316;H01L21/768;(IPC1-7):H01L21/469;H01L21/31 |
主分类号 |
C23C16/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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