发明名称 |
Process for producing dielectric thin films |
摘要 |
A process for forming a nanoporous silica dielectric coating on a substrate. A substrate containing a deposited film is suspended within a sealable hotplate, while remaining free of contact with the hotplate. The hotplate is sealed and an inert gas is flowed across the substrate. The hotplate is heated to a temperature of from about 350° C. or higher, and the substrate is forced to contact the heated hotplate. The substrate is heated for a time that sufficiently removes outgassing remnants from the resultant nanoporous dielectric coating.
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申请公布号 |
US2002173168(A1) |
申请公布日期 |
2002.11.21 |
申请号 |
US20010145935 |
申请日期 |
2001.10.26 |
申请人 |
RAMOS TERESA;SMITH DOUGLAS M.;DRAGE JAMES;ROBERTS RICK |
发明人 |
RAMOS TERESA;SMITH DOUGLAS M.;DRAGE JAMES;ROBERTS RICK |
分类号 |
C23C18/12;H01L21/316;H01L21/768;(IPC1-7):H01L21/31 |
主分类号 |
C23C18/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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