Device for coating substrates having a curved surface contains a pair of rectangular magnetron sources and substrate holders arranged in an evacuated chamber

摘要

Device for coating substrates (3) having a curved surface contains a pair of rectangular magnetron sources (1, 2) and substrate holders arranged in an evacuated chamber. The substrates are moved linearly relative to the magnetron sources during coating. The magnetron sources have planar rectangular targets having a length to width ratio of at least 2:1 and are arranged in a longitudinal manner to the transporting direction of the substrates. The centers of the targets are arranged at a distance from each other which corresponds to the substrate expansion across the transporting direction. Preferred Features: The distance between the target centers is larger than the expansion of the substrates across the transporting direction. The energy in the magnetron sources in the form of unipolar pulses having a frequency of 10-100 kHz.