发明名称 MICROLITHOGRAPIC PROJECTION ILLUMINATION SYSTEM, OPTICAL SYSTEM, METHOD FOR THE PRODUCTION OF A MICROLITHOGRAPHIC PROJECTION LENS SYSTEM AND MICROLITHOGRAPHIC STRUCTURING METHOD
摘要 The injection relates to a projection illumination system, especially one with 157 or 193 nm and an image-side NA of 0.8 0.95, comprising fluoride crystal lenses (43, 43), wherein the negative effect of the angle-dependent birefringence thereof is reduced by relative rotation around the optical axis (O) and/or by a correction element (44) close to a plane of the pupil (P).
申请公布号 WO02093257(A2) 申请公布日期 2002.11.21
申请号 WO2002EP04900 申请日期 2002.05.04
申请人 ZEISS, CARL;CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG;BRUNOTTE, MARTIN;HARTMAIER, JUERGEN;HOLDERER, HUBERT;KAISER, WINFRIED;KOHL, ALEXANDER;KUGLER, JENS;MAUL, MANFRED;WAGNER, CHRISTIAN 发明人 BRUNOTTE, MARTIN;HARTMAIER, JUERGEN;HOLDERER, HUBERT;KAISER, WINFRIED;KOHL, ALEXANDER;KUGLER, JENS;MAUL, MANFRED;WAGNER, CHRISTIAN
分类号 G02B7/02;G02B1/02;G02B5/30;G03F7/20;H01L21/027 主分类号 G02B7/02
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