发明名称 Multilayer substrate for a buildup with a via, and method for producing the same
摘要 A multilayer substrate for a buildup with a via, which multilayer substrate comprises a base material comprising an insulation resin layer on which a predetermined hole is formed, wherein an electrodeposition layer is formed by circular oscillation electroplating on the inside wall surface of the hole and on the predetermined surface of the insulation resin layer, the electrodeposition layer on the inside wall surface of the hole being formed in a thickness greater than the electrodeposition layer formed on the surface of the insulation resin layer and a method for the production of the substrate.
申请公布号 US2002170827(A1) 申请公布日期 2002.11.21
申请号 US20020090420 申请日期 2002.02.27
申请人 FURUYA SHUICHI 发明人 FURUYA SHUICHI
分类号 H05K3/00;C25D5/00;C25D7/12;H05K3/02;H05K3/10;H05K3/38;H05K3/42;H05K3/46;(IPC1-7):C23C14/32 主分类号 H05K3/00
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