| 发明名称 |
Chemical vapor deposition apparatus |
| 摘要 |
A chemical vapor deposition apparatus includes a ground voltage source, a susceptor for placing a substrate, a center pin passing through the susceptor for lifting the substrate, and a ground member for connecting the center pin to the ground voltage source.
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| 申请公布号 |
US2002170498(A1) |
申请公布日期 |
2002.11.21 |
| 申请号 |
US20020144806 |
申请日期 |
2002.05.15 |
| 申请人 |
LG. PHILIPS LCD CO., LTD. |
发明人 |
PAIK YOUNG HUN |
| 分类号 |
C23C16/458;C23C16/509;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/458 |
| 代理机构 |
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