发明名称 INSULATING STRUCTURE IN CONTINUOUS PLASMA POLYMERIZATION LINE
摘要 PURPOSE: An insulating structure in a continuous plasma polymerization line is provided to insulate a space between the shaft support part of a roller that is conducted in the continuous plasma polymerization line using a substrate as an electrode and chambers supporting the shaft support part of the roller. CONSTITUTION: In a continuous plasma polymerization line which comprises a transfer chamber comprising an unwinding roll for unwinding a substrate and a winding roll for winding the substrate, a polymerization chamber in which the substrate transferred from the unwinding roll is polymerized, and an idle roller for giving tension to the substrate that is being transferred in the transfer chamber or the polymerization chamber, and in which the surface treated substrate is used as one of electrodes, the insulating structure in the continuous plasma polymerization line comprises a shaft support part for supporting both ends of the idle roller; a first insulating member(21) for insulating between the shaft support part and the bottom surface of the chambers; a clamping means for fixing the shaft support part onto the bottom surface of the chambers; and a second insulating member(22) for insulating the clamping means, wherein the insulating structure further comprises a third insulating member(23) that is a clamping means cover for covering the clamping means at the upper part of the clamping means, the shaft support part comprises a bearing(28), a bearing block(26) and a bearing cover(25), and the transfer chamber comprises an unwinding chamber comprising an unwinding roll and a winding chamber comprising a winding roll.
申请公布号 KR20020086793(A) 申请公布日期 2002.11.20
申请号 KR20010025893 申请日期 2001.05.11
申请人 LG ELECTRONICS INC. 发明人 CHO, SEOK JE;YOON, DONG SIK
分类号 C23C16/54;(IPC1-7):C23C16/54 主分类号 C23C16/54
代理机构 代理人
主权项
地址
您可能感兴趣的专利