| 摘要 |
FIELD: microelectronics, photolithographic production of elements of structures on semiconductor and other substrates. SUBSTANCE: method determining vitrification temperature of polymer films, photoresistive films included, is carried out by construction of "thermooptical curve" taken in wide temperature interval of 100-180 C. Refractive index of thin polymer film is chosen as temperature-dependent parameter which changes are controlled with the help of automatic ellipsometer on wave length lambda=546,1 nm and are registered on tape of automatic recording potentiometer. Number of dependencies of refractive index on time, while temperature is constant, is constructed after execution of series of experiments. Time interval on which expiration values of refractive index stabilize is selected and on basis of these data taken from graph "thermooptical curve" is plotted that is the used to determine vitrification temperature of thin polymer films. EFFECT: enhanced determination accuracy, possibility of utilization of method in analysis of thin polymer films. 6 dwg
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