| 摘要 |
A monitor pattern for photolithography according to the invention includes a concave quadrangular sub-pattern and a scale sub-pattern. The concave quadrangular sub-pattern has a pair of equal exterior sides, a pair of equal interior sides and a right angle included between the pair of equal exterior sides and is bisected into a horizontal region and a vertical region congruent with each other along a bisector of the right angle. The scale sub-pattern is located along the pair of equal exterior sides for measuring the resolutions of the concave quadrangular sub-patterns transferred. Furthermore, a monitor pattern according to the invention can includes two symmetric concave quadrangular sub-patterns and two symmetric scale sub-patterns for the purpose of further determining whether resolution are affected by leveling.
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