发明名称 |
Method of preparing barrier rib master pattern for barrier rib transfer and method of forming barrier ribs |
摘要 |
A method of preparing a barrier rib master pattern for barrier rib transfer, which includes the steps of forming a photosensitive material layer on a substrate performing oblique exposure by projecting exposure light onto the photosensitive material layer with the intervention of a photomask obliquely with respect to the substrate, and developing the photosensitive material layer, whereby a rib pattern having tapered side walls is formed on the substrate. |
申请公布号 |
US6482575(B2) |
申请公布日期 |
2002.11.19 |
申请号 |
US20010826902 |
申请日期 |
2001.04.06 |
申请人 |
FUJITSU LIMITED |
发明人 |
TOKAI AKIRA;TOYODA OSAMU;BETSUI KEIICHI |
分类号 |
G03F1/08;B41M1/10;B41M3/00;B41M3/06;G03F1/00;G03F1/70;G03F7/20;H01J9/02;H01J9/24;H01J11/02;H01J11/12;H01J11/22;H01J11/24;H01J11/26;H01J11/34;H01J11/36;H01J17/49;H04N5/66;(IPC1-7):H01J9/24 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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