发明名称 Method of preparing barrier rib master pattern for barrier rib transfer and method of forming barrier ribs
摘要 A method of preparing a barrier rib master pattern for barrier rib transfer, which includes the steps of forming a photosensitive material layer on a substrate performing oblique exposure by projecting exposure light onto the photosensitive material layer with the intervention of a photomask obliquely with respect to the substrate, and developing the photosensitive material layer, whereby a rib pattern having tapered side walls is formed on the substrate.
申请公布号 US6482575(B2) 申请公布日期 2002.11.19
申请号 US20010826902 申请日期 2001.04.06
申请人 FUJITSU LIMITED 发明人 TOKAI AKIRA;TOYODA OSAMU;BETSUI KEIICHI
分类号 G03F1/08;B41M1/10;B41M3/00;B41M3/06;G03F1/00;G03F1/70;G03F7/20;H01J9/02;H01J9/24;H01J11/02;H01J11/12;H01J11/22;H01J11/24;H01J11/26;H01J11/34;H01J11/36;H01J17/49;H04N5/66;(IPC1-7):H01J9/24 主分类号 G03F1/08
代理机构 代理人
主权项
地址