Low residue aqueous hard surface cleaning and disinfecting compositions.

摘要

Aqueous based cleaning compositions simultaneously featuring low residue deposition, sanitization and/or disinfecting of treated hard surfaces, and good cleaning characteristics are provided. The compositions include the following ingredients: (a) a quaternary ammonium surfactant compound having germicidal properties; (b) a surfactant system which includes at least one amine oxide surfactant and at least one further surfactant selected from carboxylates and N-acyl amino acid surfactants; (c) a solvent system containing an alkylene glycol ether solvent further with a C1-C6 alcohol; (d) an alkalizing agent; and (e) water.