发明名称
摘要 <p>PROBLEM TO BE SOLVED: To provide a method for easily forming a bump on the pad of a work where an oxide film is removed. SOLUTION: An oxide film 2' formed when the pads 2 of a work 1 come into contact with air is removed by plasma etching, then a metal film 6 is formed on the upside of the work 1, and a solder 7 wider than the pad 2 in area is formed on each of the pads 2. Then, the work 1 is heated through a reflow oven, whereby the solders 7 are melted and formed into hemispherical bumps 7' on the pads 2 through surface tension, and the metal film 6 coming into contact with the solders 7 is melted into molten solder, so that the bumps 7 of alloy of solder and metal contained in the metal film 6 are formed. A cut part 8 is induced between the bump 7' and the metal film 6 on the upside of the work 1, so that the bump 7' is restrained from being electrically connected to the metal film 6 on the work 1.</p>
申请公布号 JP3346169(B2) 申请公布日期 2002.11.18
申请号 JP19960144060 申请日期 1996.06.06
申请人 发明人
分类号 B23K1/20;C23C16/50;H01L21/302;H01L21/60;H05K3/26;H05K3/34;(IPC1-7):H05K3/34;H01L21/306 主分类号 B23K1/20
代理机构 代理人
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