BAKE UNIT FOR SPINNER EQUIPMENT

摘要

PURPOSE: A bake unit for a spinner equipment is provided to coat uniformly HDMS(Hexamethyl Disilazane, (CH3)6NSi2) on a wafer by forming a plurality of nozzles on a bake cover. CONSTITUTION: A bake unit is formed with a bake plate(10) and a bake cover(20). The bake plate(10) is a loading part on which a wafer(W) is loaded. A plurality of holes are formed on a surface of the bake plate(10). The bake cover(20) is used for covering an upper portion of the bake plate(10). A plurality of nozzle(30) are formed on the bake cover(20) in order to spray HDMS on a surface of the wafer. The HDMS is used for improving coating efficiency of a photoresist which is coated on the wafer(W). A heating portion is installed in the bake plate(10) in order to harden the HDMS coated on the wafer.