发明名称 Passivation layer on a semiconductor device with a ferroelectric layer
摘要 A semiconductor device includes at least a ferroelectric or high-dielectric-constant film and a surface coating that have been stacked in this order over a substrate. The surface coating is made of an acrylic resin. <IMAGE>
申请公布号 EP1256979(A1) 申请公布日期 2002.11.13
申请号 EP20010123445 申请日期 2001.09.28
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 UMEDA, KAZUO;MATSUNAGA, KEIICHI
分类号 H01L27/105;H01L21/02;H01L21/8242;H01L21/8246;H01L23/29;H01L23/556;H01L27/108;H01L27/115 主分类号 H01L27/105
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