| 发明名称 |
Method of calibrating a lithographic apparatus |
| 摘要 |
<p>An alignment marker for use in calibration of a lithographic projection apparatus has focus- and dose-sensitive parts, each of which comprises an area having a plurality of dots against a contrasting background forming part of a periodic line structure. <IMAGE></p> |
| 申请公布号 |
EP1256849(A1) |
申请公布日期 |
2002.11.13 |
| 申请号 |
EP20020253177 |
申请日期 |
2002.05.07 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BASELMANS, JOHANNES JACOBUS MATHEUS |
| 分类号 |
G03F7/20;G03F9/00;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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