| 发明名称 |
Low-sputter-yield coating for hardware near laser-produced plasma |
| 摘要 |
The invention relates to an extreme ultraviolet lithography system that utilizes thin film protective coatings to protect a plurality of hardware components, located near a laser-produced light source, from the erosive effects of energetic particles emitted by the laser-produced light source.
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| 申请公布号 |
US6479830(B1) |
申请公布日期 |
2002.11.12 |
| 申请号 |
US20000704414 |
申请日期 |
2000.11.01 |
| 申请人 |
TRW INC. |
发明人 |
FORNACA STEVEN W.;TALMADGE SAMUEL |
| 分类号 |
G21K5/00;G03F7/20;H01L21/027;H01S3/094;H05H1/24;(IPC1-7):H01J37/08;G03C5/00;H05H6/00 |
主分类号 |
G21K5/00 |
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