Method of manufacturing two-color filter

摘要

A method of manufacturing a two-color filter. The method includes forming a first metallic layer over a substrate and then forming a second metallic layer over the first metallic layer. A patterned photoresist layer is formed over the second metallic layer. A portion of the first metallic layer and the second metallic layer in region not covered by the photoresist layer are removed by etching to form a third metallic layer and a fourth metallic layer over the substrate respectively. An optical film is formed over the photoresist layer and the substrate such that the optical film is able to cover only a portion of the sidewalls of the fourth metallic layer or a portion of the third metallic layer. The extent of coverage by the optical film on the sidewalls can be controlled through careful adjustment of the thickness of the first and the second metallic layer. Finally, the third metallic layer, the fourth metallic layer and the photoresist layer are removed so that an optical film previously attached to the sidewalls of the third and fourth metallic layer remains over the substrate.