| 摘要 |
In a semiconductor device, each electrode pad portion is structured by a metal portion, such as a W film, buried in a recess of an oxide film and vertically extended and a pad film, such as an Al alloy film, partially contacted with the metal portion. An underlying film, such as a TiN film, underlies the pad film and the metal portion and is deposited on a conductive film, such as a Ti film, which is contacted with the oxide film and the recess of the oxide film. With this structure, peeling off can be avoided in the pad film, the underlying film, and the conductive film when a wiring line is bonded to the pad film.
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