发明名称 |
Apparatus and method for phase shift photomasking |
摘要 |
A photolithographic method and apparatus are disclosed. The apparatus uses a diffraction plate or traditional optical elements to control and shape the light from an illuminator into a Gaussian light intensity distribution for illuminating a phase shift photomask. The Gaussian distribution reduces asymmetrical aberrations of the objective lens that are exaggerated by the phase shift photomask.
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申请公布号 |
US6480263(B1) |
申请公布日期 |
2002.11.12 |
申请号 |
US20000526592 |
申请日期 |
2000.03.16 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
SMITH BRUCE W. |
分类号 |
G03F1/00;G03F7/20;(IPC1-7):G03B27/52;G03B27/68;G03B27/42 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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