发明名称 |
PRODUCING METHOD OF MICRO OPTICAL ELEMENT, MICRO OPTICAL ELEMENT BY THE PRODUCING METHOD, AND OPTICAL DEVICE USING THE ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a producing method of a micro-optical element capable of suppressing the generation of drift of a ion beam due to steep change in charging and accurately machining a micro opening portion, in machining by a focusing ion beam (FIB machining), a micro optical element by the producing method, and an optical device using the element. SOLUTION: The producing method of the micro-optical element forming an opening portion less than light wavelength comprises a process preparing a conductive lightproof film, an insulating light transmission base element, and a workpiece inserted between the conductive lightproof film and the insulating light transmission base element having a conductive light transmission film; and a process forming irradiating a focusing ion beam to the workpiece and forming the opening portion less than light wavelength at a required position by etching all of the conductive lightproof film and a part of conductive light transmission film.
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申请公布号 |
JP2002326199(A) |
申请公布日期 |
2002.11.12 |
申请号 |
JP20010129376 |
申请日期 |
2001.04.26 |
申请人 |
CANON INC |
发明人 |
AEBA TOSHIAKI;KURODA AKIRA |
分类号 |
G02B5/00;B23K15/00;B81C1/00;B82B3/00;H01L21/302;H01L21/3065;H01L21/3213;(IPC1-7):B81C1/00;H01L21/306;H01L21/321 |
主分类号 |
G02B5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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