发明名称 |
Process for manufacturing micromechanical and microoptomechanical structures with pre-applied patterning |
摘要 |
The present invention provides a micromechanical or microoptomechanical structure. The structure is produced by a process comprising defining a pattern on a single crystal silicon layer separated by an insulator layer from a substrate layer; defining a structure in the single-crystal silicon layer; depositing and etching a polysilicon layer on the single crystal silicon layer, with remaining polysilcon forming mechanical or optical elements of the structure; and releasing the formed structure.
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申请公布号 |
US6479311(B1) |
申请公布日期 |
2002.11.12 |
申请号 |
US20000724506 |
申请日期 |
2000.11.27 |
申请人 |
MICROSCAN SYSTEMS, INC.;XEROX CORPORATION |
发明人 |
SCHARF BRUCE R.;KUBBY JOEL A.;CHEN JINGKUANG;GULVIN PETER M.;LIN CHUANG-CHIA;TRAN ALEX T. |
分类号 |
B81C1/00;B81B3/00;H01L21/762;H01L27/14;(IPC1-7):H01L21/00 |
主分类号 |
B81C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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