发明名称 DRAM cell capacitor and manufacturing method thereof
摘要 A method for manufacturing a cell capacitor includes a step of forming an upper electrode and a trench for the lower electrode simultaneously in a single mask step. Further steps for manufacturing a cell capacitor includes forming a storage node contact by employing a predefined plate silicon layer and forming a capacitor dielectric using the storage contact node, as a result, it becomes possible to resolve "lift-off" problems, twin-bit failures, and misalignment.
申请公布号 US6479343(B1) 申请公布日期 2002.11.12
申请号 US20000510247 申请日期 2000.02.22
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HWANG YOO-SANG;SONG SANG-HO;PARK BYUNG JUN;CHUNG TAE YOUNG
分类号 H01L21/02;H01L21/768;H01L21/8242;H01L27/108;(IPC1-7):H01L21/824 主分类号 H01L21/02
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