Vorrichtung zum thermischen Behandeln von Halbleitermaterial,申请号DE19651519794-传众专利搜索

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发明名称	Vorrichtung zum thermischen Behandeln von Halbleitermaterial
摘要
申请公布号	DE1519794(A1)	申请公布日期	1969.04.10
申请号	DE19651519794	申请日期	1965.06.16
申请人	FUJITSU LTD.;TOKAI ELECTRODE MFG.CO.LTD.	发明人	SHIGEHIKO YAMADA,DIPL.-ING.;MATAMI YASUFUKU,DR.-ING.;GOMI,YASUAKI
分类号	H01L21/205;C04B35/52;C30B29/00;C30B35/00	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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