| 摘要 |
PROBLEM TO BE SOLVED: To polish all workpieces evenly even if a relative distance of any workpiece to a polishing part has a deviation. SOLUTION: A polishing device comprises a polishing head 22 with an abrasive sheet 23 attached to a top face, and a support mechanism 30 for supporting the polishing head 22 from below so that it can tilt. The support mechanism 30 comprises a base 21 for housing the polishing head 23 with the abrasive sheet 23 exposed out, and a coil spring 31 for supporting the polishing head 23 from below in the base 21 while allowing it to tilt.
|
