发明名称 Polishing method and apparatus
摘要 The present invention relates to a polishing method using a grindstone comprising abrasive grains and a bonding resin for bonding the abrasive grains, as well as to a polishing apparatus to be used for the polishing method. By using a resin for bonding abrasive grains, it is possible to obtain a grindstone having a desired modulus of elasticity. With such a grindstone, the surface of a substrate having concave and convex portions can be rendered uniformly flat, irrespective of the size of the concave and convex portions. Further, by first polishing the substrate surface with a polishing tool of a small elastic modulus and thereafter polishing it with a polishing tool of a large elastic modulus, it is possible to obtain a polished surface of reduced damage. The method of the invention is effective in planarizing various substrate surfaces having concave and convex portions.
申请公布号 US6478977(B1) 申请公布日期 2002.11.12
申请号 US20000500238 申请日期 2000.02.08
申请人 HITACHI, LTD. 发明人 MORIYAMA SHIGEO;YAMAGUCHI KATSUHIKO;HOMMA YOSHIO;MATSUBARA SUNAO;ISHIDA YOSHIHIRO;KAWA-AI RYOUSEI
分类号 B24B27/00;B24B37/04;B24D3/00;B24D3/28;B24D13/14;H01L21/3105;(IPC1-7):C01B33/00 主分类号 B24B27/00
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