| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a manufacturing method of a multilayer film reflecting mirror for forming a film in a short time, and thinning the thickness of an interface layer, and an exposure device. SOLUTION: This multilayer film reflecting mirror 50 is formed by alternately laminating an Mo layer 51 and an Si layer 53 on a base board 55. The respective layers are formed by two kinds of forming conditions of a first condition and a second condition. The first condition is a condition of thinning the thickness of the interface layer more than when formed by the second condition, and the second condition is a condition of being faster in a forming speed of the layers more than when formed by the first condition. A first layer 51a of the Mo layer 51 is formed by the first condition, and afterwards, a second layer 51b is formed by the second condition. A first layer 53a of the Si layer 53 is formed by the first condition, and a second layer 53b is formed by the second condition.</p> |
