| 摘要 |
PROBLEM TO BE SOLVED: To reduce the aberration of an image on a wafer of a reduced projector used for the lithography and obtain a desired processing space. SOLUTION: The scanning ring field reduced projector performs a lithographic patterning for producing devices in a design unit of maximum 0.4μm, using X-ray radiations in a wavelength range of 300-40Å. The optical constitution of this apparatus is of a total reflection type comprising a first concave mirror 25, a second convex mirror 26 and a third concave mirror 30 forming a three-face structure with a fourth concave bending mirror 29 inserted between the second and third mirrors 26, 30.
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