| 摘要 |
PROBLEM TO BE SOLVED: To provide a position measuring apparatus which prevents false detection and measures position information of a mark at a high accuracy, and to provide an aligner and an exposure system for accurately forming a fine pattern on a body. SOLUTION: The apparatus irradiates a wafer with a detecting beam, receives a generated beam to obtain waveform data, processes the data to set a combination of mark candidates every mark if a plurality of mark candidates exist (S34), executes the EGA calculation every set combination (S38) to determine a combination which minimizes the remaining error component between an actually measured value of a sample shot and a calculated value obtained by the EGA calculation, and specifies one of the mark candidates every mark (S42).
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