| 摘要 |
<p>PROBLEM TO BE SOLVED: To satisfactorily make the exposure even if a spherical aberration remains in an alignment system. SOLUTION: The exposure method comprises a step of detecting the deviation value of a reference focus position of a detection optical system on an image plane of a projection optical system using a light from a reference step mark through the detection optical system, a step of setting a substrate having a measuring mark at the reference focus position, a step of detecting the position of the measuring mark set at the reference focus position in a direction crossing this position using the detection optical system, a step of detecting the deviation value of the reference focus position of the detection optical system on the image plane of the projection optical system, a step of setting a surface of the substrate to be exposed on the image plane of the projection optical system based on information detected in the step of detecting the deviation value of the reference focus position of the detection optical system on the image plane of the projection optical system, and a step of projecting a pattern image of the mask on the surface to be exposed using the projection optical system.</p> |
