发明名称 PHOTOSENSITIVE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive composition which gives a lithographic printing plate having excellent wear resistance, printing durability and chemical resistance and high printing durability even when printing is carried out by using UV ink without burning treatment, and moreover, which gives a lithographic printing plate having a wide range of conditions for development, causing no contamination during printing, having excellent coupling performance, adaptability for a ball point pen, sensitivity and storage stability and slightly having decrease in the performance such as changes in the sensitivity with time after exposure. SOLUTION: The photosensitive composition contains an o-naphthoquinone diazide and a vinyl polymerizable high polymer compound insoluble with water and soluble with an alkaline aqueous solution. The vinyl polymerizable high polymer compound is a copolymer containing at least each one kind of monomer unit derived from a compound having alkali-soluble groups expressed by specified general formula and derived from a compound having onium groups expressed by specified general formula.
申请公布号 JP2002323763(A) 申请公布日期 2002.11.08
申请号 JP20010064547 申请日期 2001.03.08
申请人 FUJI PHOTO FILM CO LTD 发明人 FUJITA KAZUO;TAN SHIRO
分类号 G03F7/033;C08F212/14;C08F220/02;C08K5/28;C08L25/18;C08L33/14;C08L33/26;G03F7/00;G03F7/022 主分类号 G03F7/033
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