METHOD FOR PRODUCING TITANIA-DOPED FUSED SILICA EXTREME ULTRAVIOLET LITHOGRAPHY SUBSTRATES GLASS

摘要

A titania precursor (18) and a silica precursor (6) are mixed in a manifold (14) and are fed to a burner (28) to create soot (40) which is deposited on a deposition surface (34) which is rotated and elevated. The end product is useful for Extreme UV lithography.