| 摘要 |
Disclosed are systems for, and methods of forming and applying 40 micron or greater diameter, substantially radially homogeneous, relatively high, (eg. 30-60 or greater J/cm 2), energy density, preferably 200-380 nm UV wavelength, (typically Nd-YAG Iraser produced 213 nm or 266 nm wavelength), electromagnetic radiation laser pulse(s), or equivalent in a continuous wave, to uniformly substantially purely optically ablate material from sample systems; coupled with analysis thereof in (ICP-OES), (ICP-MS), (MIP-OES), (MIP-MS) or other plasma based analysis systems, with relative freedom from calibration errors arising from element fractionation. Further disclosed is methodology for uniformly ablating material from sample systems such as gem stones for high sensitivity, high acuracy analysis, the damaging effects of which are, or can be rendered undetectable; and methodology criteria for determining, accepting and applying combinations of electromagnetic radiation defining parameters for use in sample system ablation.
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