发明名称 METHOD FOR THINNING AND POLISHING THE DIE OF INTEGRATED CIRCUITS
摘要 A reliable, inexpensive "back side" thinning process, capable of globally thinning an integrated circuit die (4) to a target thickness of 10 microns, and maintaining a yield of at least 80%, for chip repair and/or failure analysis of the packaged die. The flip-chip packaged die is exposed at its backside (10) and mounted on a lapping machine (14) with the backside exposed. The thickness of the die is measured at at least five locations on the die. The lapping machine grinds the exposed surface of the die to a thickness somewhat greater than the target thickness. The exposed surface of the die is polished. The thickness of the die is again measured optically with high accuracy. Based on the thickness data collected, appropriate machine operating parameters for further grinding and polishing of the exposed surface are determined. Further grinding and polishing are performed. These steps are repeated until the target thickness is reached.
申请公布号 WO02072311(A3) 申请公布日期 2002.11.07
申请号 WO2002US07305 申请日期 2002.03.11
申请人 SCHLUMBERGER TECHNOLOGIES, INC. 发明人 TSAO, CHUN-CHENG;VALLIANT, JOHN
分类号 B24B1/00;B24B7/22;B24B37/04;B24B49/12 主分类号 B24B1/00
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