| 摘要 |
<p>An EUV source (82) that delivers a laser beam (94, 96) asymmetrical relative to first collection optics (88). The first collection optics (88) has an opening (90, 92) for the laser beam (94, 96) that is positioned so that the laser beam (94, 96) is directed towards the plasma off-axis relative to the collection optics (88). Thus, the strongest EUV radiation (98, 100) is not blocked by the target production hardware (84). <IMAGE></p> |
