| 摘要 |
PURPOSE: To provide an ion beam irradiation device and an operating method related to it in a high frequency discharge plasma generator for the charge suppression of a substrate, which are capable of certainly igniting a plasma with ease and without introducing such problems as metal contamination. CONSTITUTION: In this ion beam irradiation device and its operating method, an ion beam 2 is made to run when igniting a plasma 16 in a plasma generator 10, and also a positive voltage with respect to the ground is applied to a plasma- producing chamber 12 from a DC source 36, and secondary electrons 40 produced by the collision of plasma-producing gas 18, flowing out of the plasma-producing chamber 12 to the path of the ion beam 2, and the ion beam 2 is drawn into the plasma-producing chamber 12 with the positive voltage, and then the plasma 16 is ignited by the trigger of the secondary electrons 40.
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