发明名称 SEMICONDUCTOR MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To raise heat insulation characteristics at an oven opening part of a semiconductor manufacturing device, to reduce radiated heat amount, resulting in less thermal load on each heat-insulation part. SOLUTION: The semiconductor manufacturing device comprises a heat treatment oven which at least comprises a pipe 4 and a heater unit 2 so concentrically provided as to enclose the pipe. A heat-insulating ring packing 38 is provided at a lower end of a space 25 formed with the pipe and the heater unit. The heat-insulating ring packing comprises a peripheral part 40 interposed in a gap 20 communicating with the space, and a heat-insulating ring body 39 which, formed integrally with the peripheral part, closes the space which is gap faces.
申请公布号 JP2002319546(A) 申请公布日期 2002.10.31
申请号 JP20010125138 申请日期 2001.04.23
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 HOSAKA EIJI;MATSUMOTO NAOKI;YANAGAWA HIDEHIRO;MIYATA TOSHIMITSU
分类号 H01L21/22;H01L21/205;(IPC1-7):H01L21/22 主分类号 H01L21/22
代理机构 代理人
主权项
地址