发明名称 WIRING METHOD AND ELEMENT ARRANGING METHOD USING THE SAME, AND METHOD OF PRODUCING IMAGE DISPLAY DEVICES
摘要 <p>It is made possible to form via holes with ease, and a satisfactory via hole shape is realized to eliminate continuity failure. An insulation layer is formed on a first wiring layer, and after the insulation layer is formed with an opening, a second wiring layer is formed. In forming the opening, a laser beam is radiated to the insulation layer with its focal point deviated. Deviating the focal point of the laser beam results in the taper angle of the opening being widened and the lateral wall becoming an inclined surface, and when a wiring layer is formed thereon, it reliably adheres also to the lateral wall.</p>
申请公布号 WO2002086964(P1) 申请公布日期 2002.10.31
申请号 JP2002003674 申请日期 2002.04.12
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址