发明名称 EXPOSURE DEVICE FOR OPTICAL DISK MASTER DISK
摘要 PROBLEM TO BE SOLVED: To efficiently carry out the stable exposure processing of an optical disk master disk. SOLUTION: A load lock chamber is placed in a vacuum chamber on the extension of a turntable 8 in the vacuum chamber as a space chamber. As a means for fixing a resist plate 13 on a turntable 8, a structure of holding the resist plate 13 by chucking pins 16 from three directions is adopted. A center boss 15 is fixed on the central part rear surface of the resist plate 13, and the chucking pins 16 and a fixing pin 17 are provided in the turntable 8. The resist plate 13 is positioned with respect to the turntable 8 and eccentricity between the resist plate 13 and the turntable 8 is removed only by placing the resist plate 13 on the turntable 8 since the fitting surfaces of the turntable 8 and the center boss 15 is formed into a tapered shape. The resist plate 13 is press-contacted and fixed on the turntable 8 by the engagement of the chucking pins 16 with the center boss 15, and the chucking pins 16 are fixed at the tapered part of the fixing pin 17. Furthermore, the chucking pins 16 release the center boss 15 by lowering the fixing pin 17, and thereby is easily replaced with the resist plate 13 in the load lock chamber.
申请公布号 JP2002319190(A) 申请公布日期 2002.10.31
申请号 JP20010126052 申请日期 2001.04.24
申请人 RICOH CO LTD 发明人 MIZUTA OSAMU
分类号 G03F7/20;G11B7/26;(IPC1-7):G11B7/26 主分类号 G03F7/20
代理机构 代理人
主权项
地址