发明名称 |
Apparatus for applying thin layers to a substrate |
摘要 |
A process gas source (16) is connected to the vacuum chamber (5), and a metering valve (12) actuated by an automatic controller is installed between the vacuum chamber (5) and the process gas source (16). A potentiometric measurement electrode compares the amount of a gas in the vacuum chamber (5) with a reference gas by way of a reference electrode or with a solid body substituting for the reference electrode and sends a signal to automatic control unit (14), which contains a signal amplifier. The control unit then drives the generator of the power supply or the metering valve for the process gas.
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申请公布号 |
US2002157945(A1) |
申请公布日期 |
2002.10.31 |
申请号 |
US20020127332 |
申请日期 |
2002.04.22 |
申请人 |
SZCZYRBOWSKI JOACHIM;TESCHNER GOTZ;BRUCH JURGEN |
发明人 |
SZCZYRBOWSKI JOACHIM;TESCHNER GOTZ;BRUCH JURGEN |
分类号 |
C23C14/34;C23C14/00;C23C14/54;H01J37/34;(IPC1-7):C23C14/32 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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