发明名称 |
Method of fabricating reflection-mode EUV diffusers |
摘要 |
Techniques for fabricating well-controlled, random relief, engineered surfaces that serve as substrates for EUV optical devices are accomplished with grayscale exposure. The method of fabricating a multilevel EUV optical element includes: (a) providing a substrate; (b) depositing a layer of curable material on a surface of the substrate; (c) creating a relief profile in a layer of cured material from the layer of curable material wherein the relief profile comprises multiple levels of cured material that has a defined contour; and (d) depositing a multilayer reflection film over the relief profile wherein the film has an outer contour that substantially matches that of the relief profile. The curable material can comprise photoresist or a low dielectric constant material.
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申请公布号 |
US2002160545(A1) |
申请公布日期 |
2002.10.31 |
申请号 |
US20010846150 |
申请日期 |
2001.04.30 |
申请人 |
ANDERSON ERIK;NAULLEAU PATRICK P. |
发明人 |
ANDERSON ERIK;NAULLEAU PATRICK P. |
分类号 |
C23F1/00;G02B5/20;G03C9/00;G03F7/20;H01L21/00;(IPC1-7):H01L21/00 |
主分类号 |
C23F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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