| 摘要 |
PURPOSE: An edge ring of an ESC(Electro Static Chuck) for a dry-etching is provided to minimize a formation of particles on a wafer by using an upper ring composed of vespel material. CONSTITUTION: The edge ring for focusing a plasma into a wafer fixed on an electro static chuck, comprises a lower ring(20) and an upper ring(10). At this time, the lower ring(20) is made of a ceramic material, and the upper ring(10) is composed of a vespel material. Also, the upper cross-section of the upper ring(10) faults to inner side, and the bottom surface of the lower ring(20) faults in accordance with the upper cross-section of the upper ring(10).
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