| 摘要 |
PROBLEM TO BE SOLVED: To provide a ceramic heater for semiconductor manufacturing/ inspecting equipment capable of uniformly heating a semiconductor wafer without generating a scattered temperature and capable of rapidly raising the temperature of a semiconductor wafer without dissipating heat during the heating in a semiconductor manufacturing/inspecting process. SOLUTION: This ceramic heater for semiconductor manufacturing/inspecting equipment comprises a ceramic substrate, on the surface or inside of which resistive heating elements are formed. Grooves of circular shapes in plan view are formed at least on the surface of the wafer-heating-face side of the ceramic substrate.
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