发明名称 CHECK PATTERN FOR ELEMENT CHARACTERISTICS
摘要 PROBLEM TO BE SOLVED: To realize reduction of semiconductor chip size and the effective use of a scribe region, since many monitor patterns are made in the scribe region so as to manufacture a semiconductor device. SOLUTION: The effective use of the scribe region 10 and the scale down of the chip size are enabled by forming electrode patterns 1, 2, 3, and 4 for measuring an element characteristics check pattern for a combined use as marks for dicing of the crossing of scribe regions 10, on a wafer.
申请公布号 JP2002319608(A) 申请公布日期 2002.10.31
申请号 JP20010123050 申请日期 2001.04.20
申请人 NEC YAMAGATA LTD 发明人 OGAWA TAKETOMO
分类号 H01L21/66;H01L21/301;(IPC1-7):H01L21/66 主分类号 H01L21/66
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