| 摘要 |
PROBLEM TO BE SOLVED: To provide a many-sheet simultaneous processing plasma cleaning device which performs control for obtaining the best processing conditions at any time for higher uniformity and good efficiency, since, specially, variance in out-surface uniformity is large when a plurality of magazines, etc., each mounted with many large-sized work substrates or work substrates are subjected to plasma processing together. SOLUTION: This many-sheet simultaneous processing plasma cleaning system has high uniformity and good efficiency and is enabled to easily perform quality control by work substrates by setting and holding the best conditions of cleaning, by detecting self-bias voltages generated between respective electrodes and controlling respective high-frequency output and gas supply controllers or the degree of vacuum, etc.
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