发明名称 METHOD FOR PARTIALLY SCOURING PURE SILK
摘要 PURPOSE: A method for partially scouring pure silk by removing about 25% by weight of impurities contained in silk by use of acidic chemicals such as phosphoric acid is provided which makes various patterns and designs clear while giving good flexibility and feeling. CONSTITUTION: Pure silk is printed with 3 to 4% acidic chemicals such as phosphoric acid, treated at 80 to 90deg.C for 1hr 20min to 1 hr 40min(preferably 1hr 30min) and then washed with warm water at 55 to 65deg.C.
申请公布号 KR20020082332(A) 申请公布日期 2002.10.31
申请号 KR20010021627 申请日期 2001.04.21
申请人 KIM, YOUNG BAEK 发明人 KIM, YOUNG BAEK
分类号 D06M13/292;(IPC1-7):D06M13/292 主分类号 D06M13/292
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