发明名称 CHARGED PARTICLE BEAM ALIGNER, MANUFACTURING METHOD OF DEVICE, AND CHARGED PARTICLE BEAM APPLICATION DEVICE
摘要 PURPOSE: To provide a high-precision multiple charged particle beam aligner without raising the performance of a demagnification electronic optical system. CONSTITUTION: There are provided a charged particle beam source ES which radiates a charged particle beam, an aperture array AA in which a plurality of openings are arrayed to divide the charged particle beam from the charged particle source ES into a plurality of charged particle beams, a lens array A in which a plurality of electron lenses are arrayed to form a plurality of intermediate images of the charged particle beam source ES on an almost identical plane by a plurality of charged particle beam from the aperture array AA, a blanker array BA which is on a plane where a plurality of intermediate images are formed ad comprises a plurality of blankers, and a demagnification electron optical system which projects a demagnified image of the charged particle beam source ES on a substrate.
申请公布号 KR20020082769(A) 申请公布日期 2002.10.31
申请号 KR20020021943 申请日期 2002.04.22
申请人 ADVANTEST CORPORATION;CANON KABUSHIKI KAISHA;HITACHI, LTD. 发明人 HASHIMOTO SHINICHI;MURAKI MASATO;SOHDA YASUNARI
分类号 G03F7/20;H01J37/04;H01J37/09;H01J37/305;H01J37/317;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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