发明名称 |
CHARGED PARTICLE BEAM ALIGNER, MANUFACTURING METHOD OF DEVICE, AND CHARGED PARTICLE BEAM APPLICATION DEVICE |
摘要 |
PURPOSE: To provide a high-precision multiple charged particle beam aligner without raising the performance of a demagnification electronic optical system. CONSTITUTION: There are provided a charged particle beam source ES which radiates a charged particle beam, an aperture array AA in which a plurality of openings are arrayed to divide the charged particle beam from the charged particle source ES into a plurality of charged particle beams, a lens array A in which a plurality of electron lenses are arrayed to form a plurality of intermediate images of the charged particle beam source ES on an almost identical plane by a plurality of charged particle beam from the aperture array AA, a blanker array BA which is on a plane where a plurality of intermediate images are formed ad comprises a plurality of blankers, and a demagnification electron optical system which projects a demagnified image of the charged particle beam source ES on a substrate.
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申请公布号 |
KR20020082769(A) |
申请公布日期 |
2002.10.31 |
申请号 |
KR20020021943 |
申请日期 |
2002.04.22 |
申请人 |
ADVANTEST CORPORATION;CANON KABUSHIKI KAISHA;HITACHI, LTD. |
发明人 |
HASHIMOTO SHINICHI;MURAKI MASATO;SOHDA YASUNARI |
分类号 |
G03F7/20;H01J37/04;H01J37/09;H01J37/305;H01J37/317;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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