| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive composition capable of forming a hard coat layer having not only hardness as a hard coat but also higher alkali resistance than a conventional one in spite of photo-curing type and excellent in storage stability. SOLUTION: The photosensitive composition contains a component A consisting of a polyfunctional (meth)acrylic monomer, a component B consisting of a polymer containing >=50 mol% constitutional units of formula (I) [where R1 is H and/or CH3 , and R2 is either one of formulae 2 to 6 (where m=4-12), R3 and R4 are H and/or CH3 , a component C consisting of a monofunctional monomer and a component D consisting of at least one of a photopolymerization initiator and a photosensitizer as essential components. The composition ratio of the component A represented by the equation (a) (the composition ratio of the component A)=(the pts.wt. of the component A×100/(the total pts.wt. of components A, B and C) is 60-99.8 wt.% the composition ratio of the component B represented by the equation (the composition ratio of the component B)=(the pts.wt. of the component B)×100/(the total pts.wt. of the components A, B and C) is 0.2-20 wt.% and the composition ratio of the component C represented by the equation (the composition ratio of the component C)=(the pts.wt. of the component C)×100/(the total pts.wt. of the components A, B and C) is 0.1-20 wt.%. |
